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Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing

 
: Motzek, Kristian; Partel, Stefan; Vogler, Uwe; Erdmann, Andreas

:

Smith, D.G. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Physical optics : 5 - 6 September 2011, Marseille, France; Proceedings of the Physical Optics Conference at the Optical Systems Design Symposium
Bellingham, WA: SPIE, 2011 (Proceedings of SPIE 8171)
ISBN: 978-0-8194-8797-1
Paper 81710K
Physical Optics Conference <2011, Marseille>
Optical Systems Design Symposium <2011, Marseille>
English
Conference Paper
Fraunhofer IISB ()
mask; numerical analysis; optical projectors; optical scanner; optimisation; photoresist; proximity effect

Abstract
Although proximity printing is the oldest and, in view of the basic optical setup, simplest photolithographic technique, it still remains in heavy use in the semiconductor manufacturing industry. The fact that this technique exists for a long time does not mean that there is no more room for improvements or new applications. Lending concepts developed for modern projection scanners and steppers and adapting them for our purposes, we demonstrate how numerical simulation and optimization can help to make the proximity printing process more stable against process variations and to increase the resolution for critical features. For this purpose, we numerically optimize the angular spectrum of the illumination and the mask layout. Furthermore, we couple the optimization of the optical degrees of freedom to the simulation of photoresist development to assess the effects of changes to the illumination and mask on the final photoresist profile.

: http://publica.fraunhofer.de/documents/N-192666.html