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Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes

Poster at SPIE Photomask Technology, September, Monterey, California
 
: Rudolph, Oliver; Evanschitzky, Peter; Erdmann, Andreas; Bär, Eberhard; Lorenz, Jürgen

:
Poster urn:nbn:de:0011-n-1924212 (11 MByte PDF)
MD5 Fingerprint: c395ef85d092e53c041e86f69821e0de
Created on: 17.1.2012


2011, 1 Folie
Conference "Photomask Technology" <2011, Monterey/Calif.>
English
Poster, Electronic Publication
Fraunhofer IISB ()
phase-shift photomask; rigorous electro-magnetic field (EMF) simulation; waveguide; line-edge roughness (LER); line-width roughness (LWR); CD variation; aerial image contrast; process window

: http://publica.fraunhofer.de/documents/N-192421.html