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Growth and characterization of InAlN layers nearly lattice-matched to GaN

 
: Mánuel, J.M.; Morales, F.M.; Lozano, J.G.; García, R.; Lim, T.; Kirste, L.; Aidam, R.; Ambacher, O.

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Physica status solidi. C 8 (2011), No.7-8, pp.2500-2502
ISSN: 1610-1634
ISSN: 1610-1642
ISSN: 1862-6351
International Workshop on Nitride Semiconductors (IWN) <2010, Tampa/Fla.>
European Materials Research Society (Fall Meeting) <2010, Tampa/Fla.>
English
Journal Article, Conference Paper
Fraunhofer IAF ()
compound semiconductor; InAIN; transmission electron microscopy; molecular beam epitaxy; lattice-matched

Abstract
A set of InxAl1-xN films lattice-matched (LM) to GaN/sapphire substrates were grown by molecular beam epitaxy (MBE) and studied using X-ray diffraction and transmission electron microscopy with the aim of implementing barrier and channels in high electron mobility transistors (HEMTs). Although all InAlN epilayers grow pseudomorphic to GaN, two sublayers with different compositions formed when a direct deposition onto the bare GaN buffer was carried out. On the other hand, heterostructures having single-layered In(-0.18)Al(0.82)N are achieved when a spacer consisting of an AlN interlayer or an AlN/GaN/AlN stack is placed between the InAlN and the buffer. These spacers not only yield a better compositional and structural homogeneity of the InAlN, but also improve electrical properties with respect to HEMT applications. Compared to one single AlN interlayer, the use of a triple AlN/GaN/AlN multilayer further improves the structural quality of the InAlN film.

: http://publica.fraunhofer.de/documents/N-190202.html