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UV-nanoimprinting using non-transparent molds and non-transparent substrates

: Kirchner, R.; Finn, A.; Teng, L.; Ploetner, M.; Jahn, A.; Nueske, L.; Fischer, W.-J.


Microelectronic engineering 88 (2011), No.8, pp.2004-2008
ISSN: 0167-9317
Journal Article
Fraunhofer IPMS ()

A new ultraviolet assisted nanoimprint lithography technique with an exposure through non-transparent molds and a nm-resolution capability is reported. The UV imprint material was not cured by direct irradiation, but substantially exposed to indirect and diffuse irradiation. The nanoimprint molds consisted of a transparent support and a non-transparent, patterned element. Successful imprints were conducted on transparent glass and polymer foils placed on non-transparent substrate holders as well as on SiO2 on Si. The reported technique enables the application of non-transparent mold materials like Si, new mold materials and alternative antisticking layers like metals in UV-NIL.