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Ellipsometric and surface acoustic wave sensing of carbon contamination on EUV optics



Schellenberg, F.M. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Alternative lithographic technologies. Proceedings. Pt. 1 : 24 - 26 February 2009, San Jose, California, United States
Bellingham, WA: SPIE, 2009 (SPIE Proceedings 7271)
ISBN: 978-0-8194-7524-4
Art. 727140
Conference on Alternative Lithographic Technologies <2009, San Jose/Calif.>
Conference Paper
Fraunhofer IWS ()

Carbon contamination layers, deposited on extreme ultraviolet (EUV) multilayer mirrors during illumination were characterized ex situ using spectroscopic ellipsometry (SE), laser generated surface acoustic waves (LG-SAW), and by their EUV reflectance loss. We show SE is more sensitive to the deposition of carbon layers than the EUV reflectance loss, even in the presence of the highly heterogeneous structure of the multilayer. SE has better overall sensitivity, with a detection limit of 0.2 nm, while LG-SAW has an approximate detection limit < 5 nm.