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2011
Conference Paper
Titel
Challenges of high-speed EUV mask blank inspection
Abstract
We present the current status of our EUV mask blank inspection demonstrator developed according to requirements of high-volume EUV lithography. Limitations of sensitivity and scan speed, that are caused by source flux, sample movement speed and performance of objective- and detector, are discussed. Furthermore we present alternative detection concepts and discuss their potential to overcome the limits of state of the art backthinned and backilluminated charge coupled devices (CCDs).
Author(s)