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Plasma and optical thin film technologies

: Stenzel, O.; Wilbrandt, S.; Kaiser, N.; Schmitz, C.; Turowski, M.; Ristau, D.; Awakowicz, P.; Brinkmann, R.P.; Musch, T.; Rolfes, I.; Steffen, H.; Foest, R.; Ohl, A.; Köhler, T.; Dolgonos, G.; Frauenheim, T.


Lequime, M. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in Optical Thin Films IV : SPIE Optical System Design 2011, 5.-8.9.2011, Marseille, France
Bellingham, WA: SPIE, 2011 (Proceedings of SPIE 8168)
ISBN: 978-0-8194-8794-0
Paper 81680L
Conference "Advances in Optical Thin Films" <4, 2011, Marseille>
Conference Paper
Fraunhofer IOF ()
ion beam sputtering; plasma ion-assisted film deposition; optical properties; plasma characterization; multipole plasma probe; film growth simulation; density-functional tight-binding method

The PluTO project is aimed at combining thin-film and plasma technologies. Accordingly, the consortium comprises experts in optical coating (Laser Zentrum Hannover, Fraunhofer IOF) and such in plasma technology (INP Greifswald, Ruhr University of Bochum RUB). The process plasmas available, especially the sheath layers, will be thoroughly characterized by means of special probes, so that the types, numbers and energies of the particles participating in the coating formation processes can be determined comprehensively in every detail for the first time. The data thus obtained will provide a basis for a numerical modelling of layer growth at atomic scale (Bremen Center for Computational Materials Science BCCMS). The results are expected to deepen the understanding of the physical mechanisms responsible for the influence of plasma action on the layer properties. In parallel, suitable tools for process monitoring will be identified and made available. Some first results have already been achieved which prove the viability of the approach.