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Vorrichtung und Verfahren zum Beschichten eines Substrates

Device for coating a substrate, comprises a vacuum chamber, whose interior is provided for the reception of the substrate to be coated and a sputtering target, and an arrangement for determining the ablation of the sputtering target
 
: Schöpka, U.; Öchsner, R.; Pfeffer, M.; Maass, W.; Langer, J.; Ocker, B.

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Frontpage ()

DE 102009054060 A: 20091120
DE 102009054060 A: 20091120
H01J0037
H01J0029
C23C0014
H01L0021
German
Patent, Electronic Publication
Fraunhofer IISB ()

Abstract
(A1) Die Erfindung betrifft eine Vorrichtung zum Beschichten eines Substrates, enthaltend eine Vakuumkammer, deren Innenraum zur Aufnahme des zu beschichtenden Substrates und zumindest eines Sputtertargets vorgesehen ist, welches dazu vorgesehen ist, bei Betrieb der Vorrichtung durch Teilchenbeschuss abgetragen zu werden, wobei in der Wandung der Vakuumkammer zumindest ein Fenster angeordnet ist und die Vorrichtung weiterhin eine Einrichtung zur Bestimmung des Abtrages des Sputtertargets enthaelt, welche eine Messeinrichtung zur optischen Messung des Abstandes zwischen zumindest einem vorgebbaren Punkt ausserhalb der Vakuumkammer und zumindest einem vorgebbaren Punkt auf der Oberflaeche des Sputtertargets aufweist. Weiterhin betrifft die Erfindung ein korrespondierendes Beschichtungsverfahren.

 

DE 102009054060 A1 UPAB: 20110609 NOVELTY - The device for coating a substrate (125), comprises a vacuum chamber (100), whose interior is provided for the reception of the substrate to be coated and a sputtering target (130), which is arranged additionally to remove during the operation of the device through particle bombardment, a further arrangement for determining the ablation of the sputtering target, a window (140), which is arranged in the wall of the vacuum chamber, and a positioning device in which the sputtering target is movable from operating position into measuring position. DETAILED DESCRIPTION - The device for coating a substrate (125), comprises a vacuum chamber (100), whose interior is provided for the reception of the substrate to be coated and a sputtering target (130), which is arranged additionally to remove during the operation of the device through particle bombardment, a further arrangement for determining the ablation of the sputtering target, a window (140), which is arranged in the wall of the vacuum chamber, and a positioning device in which the sputtering target is movable from operating position into measuring position, where the further arrangement for determining the ablation of the sputtering target has a measuring device (150) for optical measurement of the interval between a selectable point outside the vacuum chamber and a selectable point on the surface of the sputtering target. The positioning device has a cylinder at which the outer surface of the sputtering target is arranged. The measuring device contains a device for laser triangulation and/or interferometer and an evaluation device, which is correctable by means of parallel axis displacement and/or geometric distortion. The measuring device is moveably arranged on a holder. A regulation device is provided for regulating the determined ablation rate of the sputtering target at a predetermined set point, in which a measured value characterizing the condition of the sputtering target is provided on the measuring device for determining the ablation of the sputtering target. The measuring device is arranged to determine the interval between a predetermined point outside the vacuum chamber and predetermined points on the surface of the sputtering target. An INDEPENDENT CLAIM is included for a method for coating a substrate. USE - Device useful for coating a substrate. ADVANTAGE - The device ensures economical, rapid and safe coating of a substrate with good durability and less consumption of materials.

: http://publica.fraunhofer.de/documents/N-174796.html