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2010
Conference Paper
Titel
Checkerboard pattern for PSF parameter determination in electron beam lithography
Abstract
In electron beam lithog., the electron scattering and the corresponding proximity effect highly influence the feature resoln. Esp. for sub-100 nm features a compensation for this effect is needed. There are several methods of detn. of the proximity parameters, which mostly are time-consuming and complex due to a need of an initial proximity effect correction and immense measurement effort. In this paper the checkerboard pattern is proposed to provide the opportunity for proximity parameter detn. in a fast and easy manner without using a sophisticated CD-SEM metrol. The concept is illustrated by simulation, physicochem. and first exptl. results are shown.