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Sub surface material characterization using high frequency eddy current spectroscopy

 
: Heuer, H.; Hillmann, S.; Klein, M.; Meyendorf, N.

:

Ueda, O. ; Materials Research Society -MRS-:
Reliability and materials issues of semiconductor optical and electrical devices and materials : Symposium held November 29 - December 3, 2009, Boston, Massachusetts, U.S.A.; Symposium B, "Reliability and Materials Issues of Semiconductor Optical and Electrical Devices," was held at the 2009 MRS fall meeting
Warrendale, Pa.: MRS, 2010 (Materials Research Society Symposium Proceedings 1195)
ISBN: 978-1-605-11168-1
ISSN: 0272-9172
pp.253-258
Symposium B "Reliability and Materials Issues of Semiconductor Optical and Electrical Devices" <2009, Boston/Mass.>
Materials Research Society (Fall Meeting) <2009, Boston/Mass.>
English
Conference Paper
Fraunhofer IZFP, Institutsteil Dresden ( IKTS-MD) ()

Abstract
New processes introduced by nano science into much more conventional industrial applications require fast, robust and economical reasonable inspection methods for process control and quality assurance. Developed for semiconductor industries the methods available for thin film characterization and quality control are often complex and require highly skilled operation personnel. This paper presents a new concept based on high frequency eddy current spectroscopy that allows reliable and robust thickness measurements of thin conducting films on silicon or insulation substrates with a thickness resoln. of about 2.5 nm. The transmission mode sensor configuration is a more practical method for inline-monitoring of thin film characterization. Due to the insensitivity of the transmission mode to dislocations or slight tilting of the sample the high frequency eddy current method is a practical method for thin film characterization in the industrial environment.

: http://publica.fraunhofer.de/documents/N-173663.html