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Control and optimization of thermal oxidation processes for industrial solar cell fabrication

 
: Mack, S.; Lemke, A.; Wolf, A.; Holzinger, B.; Zimmer, M.; Biro, D.; Preu, R.

:
Postprint urn:nbn:de:0011-n-1720763 (494 KByte PDF)
MD5 Fingerprint: bb6f582cdd694d0aaa037f69fa68b25e
© 2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
Created on: 15.8.2012


Institute of Electrical and Electronics Engineers -IEEE-; IEEE Electron Devices Society:
34th IEEE Photovoltaic Specialists Conference, PVSC 2009. Vol.2 : Philadelphia, Pennsylvania, USA, 7 - 12 June 2009
Piscataway/NJ: IEEE, 2009
ISBN: 978-1-4244-2949-3
ISBN: 1-4244-2949-8
ISBN: 978-1-4244-2950-9
pp.1024-1028
Photovoltaic Specialists Conference (PVSC) <34, 2009, Philadelphia/Pa.>
English
Conference Paper, Electronic Publication
Fraunhofer ISE ()

Abstract
We present a systematic process control procedure that enables an integrated process optimization of wet chemical cleaning and subsequent thermal oxidation processes. Our approach uses distinct experiments to reveal the impact of individual parameters on the effective minority carrier lifetime. Special focus is put on an application in a production line. Therefore, both wetchemical processing and thermal oxidation take place in industry-size equipment. On 1 cm p-type floatzone (FZ) wafers with sawdamage etched surfaces, surface recombination velocities as low as (26±3) cm/s directly after oxidation and (13±1) cm/s after annealing in forming gas are achieved for an optimized process sequence.

: http://publica.fraunhofer.de/documents/N-172076.html