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Control and optimization of thermal oxidation processes for industrial solar cell fabrication

: Mack, S.; Lemke, A.; Wolf, A.; Holzinger, B.; Zimmer, M.; Biro, D.; Preu, R.

Postprint urn:nbn:de:0011-n-1720763 (494 KByte PDF)
MD5 Fingerprint: bb6f582cdd694d0aaa037f69fa68b25e
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Created on: 15.8.2012

Institute of Electrical and Electronics Engineers -IEEE-; IEEE Electron Devices Society:
34th IEEE Photovoltaic Specialists Conference, PVSC 2009. Vol.2 : Philadelphia, Pennsylvania, USA, 7 - 12 June 2009
Piscataway/NJ: IEEE, 2009
ISBN: 978-1-4244-2949-3
ISBN: 1-4244-2949-8
ISBN: 978-1-4244-2950-9
Photovoltaic Specialists Conference (PVSC) <34, 2009, Philadelphia/Pa.>
Conference Paper, Electronic Publication
Fraunhofer ISE ()

We present a systematic process control procedure that enables an integrated process optimization of wet chemical cleaning and subsequent thermal oxidation processes. Our approach uses distinct experiments to reveal the impact of individual parameters on the effective minority carrier lifetime. Special focus is put on an application in a production line. Therefore, both wetchemical processing and thermal oxidation take place in industry-size equipment. On 1 cm p-type floatzone (FZ) wafers with sawdamage etched surfaces, surface recombination velocities as low as (26±3) cm/s directly after oxidation and (13±1) cm/s after annealing in forming gas are achieved for an optimized process sequence.