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In-line and vertical texturing of mono-crystalline solar cells
|Institute of Electrical and Electronics Engineers -IEEE-; IEEE Electron Devices Society:|
35th IEEE Photovoltaic Specialists Conference, PVSC 2010. Vol.2 : Honolulu, Hawaii, USA, 20 - 25 June 2010
Piscataway/NJ: IEEE, 2010
|Photovoltaic Specialists Conference (PVSC) <35, 2010, Honolulu/Hawaii>|
| Conference Paper|
|Fraunhofer ISE ()|
Potassium Hydroxide (KOH) and Isopropanol (IPA) are currently being used to texturize and reduce the reflectivity of mono crystalline (mono-c) silicon wafer surfaces during the manufacturing of solar cells. One concern with this process is that the IPA is volatile which can lead to high replenishment rates, poor process stability, and increased costs. The flammable nature of the IPA should also be highlighted which can lead to handling and safety concerns. The goal of this work was to develop an IPA free process that does not compromise texturing or cell performance while providing improved process control. A secondary goal was to develop a chemistry that would allow for in-line texturing of mono-crystalline substrates.