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VUV spectrophotometry for photomasks characterization at 193 nm

 
: Yang, M.; Leiterer, J.; Gatto, A.; Kaiser, N.; Höllein, I.; Teuber, S.; Bubke, K.

:

Duparre, A. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical fabrication, testing, and metrology II : 13 - 15 September 2005, Jena, Germany
Bellingham/Wash.: SPIE, 2005 (SPIE Proceedings Series 5965)
ISBN: 0-8194-5983-6
Paper 59651L
Conference "Optical Fabrication, Testing, and Metrology" <2005, Jena>
English
Conference Paper
Fraunhofer IOF ()

Abstract
This paper intends to develop a measurement system to characterize photomasks for 193 nm lithography applications. Based on the VUV spectrophotometer at the Fraunhofer IOF institute, some modifications have been addressed to fulfil these special measurements. Characterizations on photomasks have been successfully carried out, which show good correlations to simulations.

: http://publica.fraunhofer.de/documents/N-171390.html