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Design, technology, and signal processing for DOE-based microinterferometer array applied in new generation M(O)EMS test equipment

: Kujawinska, M.; Józwik, M.; Styk, A.; Zeitner, U.; Røyset, A.; Beer, S.; Moosburger, R.; Gorecki, C.; Gastinger, K.


Furlong, C. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Interferometry XV. Applications : 2 and 4 - 5 August 2010, San Diego, California, United States
Bellingham, WA: SPIE, 2010 (Proceedings of SPIE 7791)
ISBN: 978-0-8194-8287-7
Paper 779103
Conference "Interferometry" <15, 2010, San Diego/Calif.>
Conference "Optics and Photonics" <2010, San Diego/Calif.>
Conference Paper
Fraunhofer IOF ()

The paper introduces different approaches to overcome the large ratio between wafer size and feature size in micro production. The EU-project SMARTIEHS develops a new concept for high volume M(O)EMS testing. The design of the test station is presented and the advancements compared to the state of the art are introduced within the following fields: micro-optical laser interferometer (LI) design, DOE-based microinterferometer production, smart-pixel camera and signal processing for resonance frequency and vibration amplitude distribution determination. The first experiments performed at LI demonstrator are also reported.