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Status of Philips' extreme UV source

 
: Pankert, J.; Bergmann, K.; Klein, J.; Neff, W.; Rosier, O.; Seiwert, S.; Smith, C.; Probst, S.; Vaudrevange, D.; Siemons, G.; Apetz, R.; Jonkers, J.; Locken, M.; Derra, G.; Krücken, T.; Zink, P.

:

Mackay, R.S. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Emerging lithographic technologies VIII. Vol.1 : 24 - 26 February 2004, Santa Clara, California, USA
Bellingham, WA: SPIE, 2004 (SPIE Proceedings Series 5374)
ISBN: 0-8194-5287-4
ISBN: 978-0-8194-5287-0
ISSN: 0277-786X
pp.152-159
Conference "Emerging Lithographic Technologies" <8, 2004, Santa Clara/Calif.>
English
Conference Paper
Fraunhofer ILT ()

Abstract
The paper describes progress of the Philips' hollow cathode triggered (HCT) gas discharge EUV source. The program has been focussed on three major areas: (1) Studying the basic physics of ignition, pinch formation and EUV generation. The paper reports on progress in this area and particularly describes the underlying atomic physics both for Xe and Sn. (2) Discharge based on Sn. Results on overall efficiency more than 5 times the Xe efficiency are reported as well as high frequency operation up to 6.5 kHz. This system shows all the necessary ingredients for scaling to production power levels. (3) Integration of the Xe source in an alpha tool. Results on integration issues like electrode life time, collector life time and dose control will be presented.

: http://publica.fraunhofer.de/documents/N-171151.html