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Finite Integration (FI) method for modelling optical waves in lithography masks

: Rahimi, Z.; Erdmann, A.; Pflaum, C.


Institute of Electrical and Electronics Engineers -IEEE-:
International Conference on Electromagnetics in Advanced Applications, ICEAA 2009. Vol.2 : Torino, Italy, 14 - 18 September 2009
New York, NY: IEEE, 2009
ISBN: 978-1-4244-3385-8 (Print)
ISBN: 978-1-4244-3386-5
International Conference on Electromagnetics in Advanced Applications (ICEAA) <11, 2009, Torino>
Conference Paper
Fraunhofer IISB ()

Light diffraction from lithography masks depends on the geometrical shape of the mask pattern which is created by an etch process. The analysis of relevant effects requires the application of an accurate electromagnetic field solver. In this paper, we present an appropriate simulation method based on the Finite Integration (FI) technique for solving Maxwell's equations.