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Extraordinary low transmission of a metamaterial for application in lithography

 
: Dobmann, S.; Ploss, D.; Reibold, D.; Erdmann, A.; Peschel, U.

Optical Society of America -OSA-, Washington/D.C.:
Conference on Lasers and Electro-Optics and the Quantum Electronics and Laser Science Conference, CLEO/QELS 2010. CD-ROM : Laser Science to Photonic Applications, May 16-21, 2010, San Jose, California
Washington, DC: OSA, 2010
ISBN: 978-1-55752-889-6
ISBN: 978-1-55752-890-2
Paper QThE3
Conference on Lasers and Electro-Optics Europe (CLEO) <2010, San Jose/Calif.>
Quantum Electronics and Laser Science Conference (QELS) <2010, San Jose/Calif.>
English
Conference Paper
Fraunhofer IISB ()

Abstract
We present experiments on a metamaterial made from an ultrathin (< 40 nm) metal film. It exhibits extraordinary low transmission due to an antenna resonance and may form building blocks of future lithographic masks.

: http://publica.fraunhofer.de/documents/N-170922.html