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2003
Journal Article
Titel
Deep UV laser induced fluorescence in fluoride thin films
Abstract
Fluorescence experiments have been performed to study the interaction of 193-nm laser radiation with dielectric thin films of LaF/sub 3/, AlF/sub 3/, and MgF/sub 2/. Spectral- and time-resolved measurements reveal the presence of cerium in LaF/sub 3/ and the influence of hydrocarbons in MgF/sub 2/ and LaF/sub 3/. Virtually no fluorescence response is observable in the case of AlF/sub 3/. Supplementary measurements on multilayer stacks confirm the contribution of hydrocarbon and cerium emission in high-reflective UV mirrors upon ArF excimer laser irradiation. Energy density dependent measurements indicate a linear absorption process as the origin of UV laser induced fluorescence in LaF/sub 3/. Luminescence calculations are applied as a helpful tool in order to account for interference effects that are inherently to be found in the multilayer emission spectra.
Tags
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deep UV laser induced fluorescence
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fluoride thin films
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dielectric thin films
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LaF/sub 3/
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AlF/sub 3/
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MgF/sub 2/
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time-resolved measurements
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hydrocarbons
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multilayer stacks
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cerium emission
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high-reflective UV mirrors
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ArF excimer laser irradiation
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energy density dependent measurements
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linear absorption process
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interference effects
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multilayer emission spectra
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193 nm