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Resist processes for high resolution mask and direct write applications using the latest vistec VSB electron column

 
: Sailer, H.; Irmscher, M.; Hohle, C.; Keil, K.; Boettcher, M.; Hahmann, P.

:

Japan Society of Applied Physics -JSAP-; IEEE Electron Devices Society:
Microprocesses and nanotechnology 2007. Digest of papers : 20th International Microprocesses and Nanotechnology Conference, November 5 - 8, 2007, Kyoto International Conference Center
Tokyo: Business Center for Academic Societies Japan, 2007
ISBN: 4-9902472-4-8
ISBN: 978-4-9902472-4-9
pp.82-83
International Microprocesses and Nanotechnology Conference (MNC) <20, 2007, Kyoto>
English
Conference Paper
Fraunhofer CNT ()

: http://publica.fraunhofer.de/documents/N-169031.html