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Investigation of the Suppression of the Narrow Channel Effect in Deep Sub-Micron EXTIGATE Transistors
Untersuchung der Unterdrückung des Kanalbreiteneffekts in den Tief-Submikrometer-EXTIGATE-Transistoren
29th European Solid-State Device Research Conference 1999. Proceedings
Paris: Ed. Frontieres, 1999
|European Solid-State Device Research Conference (ESSDERC) <29, 1999, Leuven>|
| Conference Paper|
|Fraunhofer IIS B ( IISB) ()|
| CMOS transistor; narrow channel effect; 3D simulation|
A suppression of the narrow channel effect for deep sub-micron CMOS transistors when using a novel device architecture called EXTIGATE has recently been shown. This work compares the narrow channel effect in the EXTIGATE and in conventional shallow trench isolated MOS transistors by means of three-dimensional coupled process and device simulation. The 3D simulation analysis shows that the bird's beak shaped thickening of the gate oxide and the sharply terminated gate electrode at the edge of the active area which are typical for the EXTIGATE technology play an important role in the suppression of the narrow channel effect.