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Current voltage characteristics through grains and grain boundaries of high-k dielectric thin films measured by tunneling atomic force microscopy

Poster at International Conference on Frontiers of Characterization and Metrology for Nanoelectronics, May 23-26, 2011, Grenoble, France
 
: Murakami, K.; Rommel, M.; Yanev, V.; Bauer, A.J.; Frey, L.

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Poster urn:nbn:de:0011-n-1645221 (560 KByte PDF)
MD5 Fingerprint: 47c4eadfe377d07e16ca7c02260ab71e
Created on: 9.6.2011


2011, 1 Folie
International Conference on Frontiers of Characterization and Metrology for Nanoelectronics <2011, Grenoble>
English
Poster, Electronic Publication
Fraunhofer IISB ()
tunneling AFM; TUNA; conductive AFM; cAFM; high-k; grain and grain boundary

: http://publica.fraunhofer.de/documents/N-164522.html