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Title
Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium, Metallspiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung
Date Issued
2009
Author(s)
Risse, S.
Gebhardt, A.
Peschel, T.
Stoeckl, W.
Patent No
102009040785
Abstract
(A1) Die Erfindung betrifft ein Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium mit aufgebrachter polierbarer Schicht sowie einen Metallspiegel, der dieses Substrat umfasst. Weiterhin betrifft die Erfindung ein Verfahren zur Herstellung von Metallspiegeln wie auch die Verwendung des erfindungsgemaessen Metallspiegels.
DE 102009040785 A1 UPAB: 20110321 NOVELTY - The substrate (1) has a polished layer (3) made of amorphous silicon, micro crystalline silicon, silicon carbide, silicon nitride, titanium nitride, zirconium oxide aluminum oxide and chromium. An interlayer (2) is arranged between the substrate and the polished layer, and is formed as an adhesion promoter or barrier layer, where thickness of the polished layer is 3 to 6 micro meters, and thickness of the interlayer is 20 to 200 nanometers. The interlayer is made of metal oxide e.g. aluminum oxide or zirconium oxide, and metal such as titanium and chromium. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for the following: (1) a metallic mirror including a compensation layer (2) a method for manufacturing a metal mirror. USE - Aluminum-silicon composition or crystalline silicon substrate for a metallic mirror that is utilized as a collector mirror in an extreme UV light source and in a reflecting telescope (all claimed). ADVANTAGE - The stable and polished layer with contrastable coefficient of expansion is arranged on the substrate in a cost effective manner to produce the metallic mirror.
Language
de
Patenprio
DE 102009040785 A: 20090909