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Industrial deposition of PECVD AIOx for rear passivation of PERC-type mc-SI solar cells
25th European Photovoltaic Solar Energy Conference and Exhibition, EU PVSEC 2010. Proceedings : 5th World Conference on Photovoltaic Energy Conversion, 6-10 , September 2010, Valencia, Spain
München: WIP-Renewable Energies, 2010
|European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <25, 2010, Valencia>|
World Conference on Photovoltaic Energy Conversion <5, 2010, Valencia>
| Conference Paper, Electronic Publication|
|Fraunhofer ISE ()|
Passivated and locally rear contacted solar cell concepts are currently leaping forward towards industrial realization. A promising candidate for rear passivation represents the deposition of aluminum oxide (AlOx) by means of plasma enhanced chemical vapor deposition (PECVD) techniques. High deposition rates, high gas utilization and good achievable layer homogeneities attract considerable interest for an industrial use of these types of layer systems. The paper reports on current activities towards an industrial implementation of PECVD deposited AlOx layers for rear passivation of multicrystalline silicon (mc-Si) solar cells. On large area PERC type mc-Si solar cells, an increase in Voc of about 1.5 % relative and in jsc of about 2.5 % relative compared to standard Al-BSF reference cells could be demonstrated, demonstrating the optical and electrical quality gain at the wafers rear side.