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Clean technology for the ultra barrier layer production

Presentation held at Flat Panel Display Materials and Manufacturing Equipment; 36th Working Group Meeting of the German Flat Panel Display Forum (DFF), December 8/9, 2010, Stuttgart
: Bürger, Frank

presentation urn:nbn:de:0011-n-1566102 (1017 KByte PDF)
MD5 Fingerprint: df8c135e3952bd1e79a358760fb9b862
Created on: 25.3.2011

2010, 14 Folien
German Flat Panel Display Forum (DFF Working Group Meeting) <36, 2010, Stuttgart>
Presentation, Electronic Publication
Fraunhofer IPA ()
Clean manufacturing; cleanroom technology; Layer Manufacturing Technology (LMT); Airborne Molecular Contamination (AMC); contamination control; equipment design; particle detection; organic light emitting diode (OLED); Reinraum; Substrat

Thin film based industries (OLED; Organic photovoltaic, CIS-thin film photovoltaic) require very dense layers. Fraunhofer IPA investigations showed that besides process parameters also contamination have an impact on the barrier of a layers. The main contamination risks are particles on substrates regarding layer penetration. Airborne molecular contamination (AMC) caused e.g. by out-gassing of materials can have a strong impact as well.