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Effect of systematic errors in spectral photometric data on the accuracy of determination of optical parameters of dielectric thin films

: Tikhonravov, A.V.; Trubetskov, M.K.; Kokarev, M.A.; Amotchkina, T.V.; Duparre, A.; Quesnel, E.; Ristau, D.; Gunster, S.


Applied optics 41 (2002), No.13, pp.2555-2560
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Journal Article
Fraunhofer IOF ()
thin film; materials characterization; process characterization

The determination of optical parameters of thin films from experimental data is a typical task in the field of optical-coating technology. The optical characterization of a single layer deposited on a substrate with known optical parameters is widely used for this purpose. Results of optical characterization are dependent on not only the choice of the thin-film model but also on the quality of experimental data. The theoretical results presented highlight the effect of systematic errors in measurement data on the determination of thin-film parameters. Application of these theoretical results is illustrated by the analysis of experimental data for magnesium fluoride thin films.