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High-precision nm-multilayers for EUV and x-ray optical application

: Braun, S.; Dietsch, R.; Foltyn, T.; Holz, T.; Mai, H.; Moss, M.; Weißbach, D.; Leson, A.

Forschungszentrum Karlsruhe GmbH, Kompetenzzentrum für Nanomaterialien -NanoMat-:
NANOFAIR 2002, European Nanotechnology Symposium
Strassbourg, 2002
European Nanotechnology Symposium (NANOFAIR) <2002, Strasbourg>
Conference Paper
Fraunhofer IWS ()

In this paper we will give an overview of the preparation, characterization and typical results of nm-multilayer coatings prepared by pulsed laser depostion (PLD) and magnetron sputter depostion (MSD). We have achieved particulary outstanding results for the Ni/C and Mo/Si materials systems, e.g. extreme ultraviolet (EUV) reflectances of >71% with Mo/Si. The thickness deviations of the multilayer period on flat and curved substrates with macroscopic dimensions (150mm diameter) are reduced down to <0.05%. The standard deviation of the thickness from run-to-tun is <0.2%.