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Detailed study of copper oxide ALD on SiO2, TaN, and Ru

 
: Wächtler, T.; Schulze, S.; Hofmann, L.; Hermann, S.; Roth, N.; Schulz, S.E.; Gessner, T.; Lang, H.; Hietschold, M.

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Poster (PDF; )

AVS, the Science and Technology Society:
ALD 2009, 9th International Conference on Atomic Layer Deposition. CD-ROM : July 19 - 22, 2009, Monterey, CA
Monterey, Calif., 2009
1 pp.
International Conference on Atomic Layer Deposition (ALD) <9, 2009, Monterey/Calif.>
English
Poster, Electronic Publication
Fraunhofer ENAS ()

: http://publica.fraunhofer.de/documents/N-151811.html