Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Rapid thermal firing of screen printed contacts for large area crystalline silicon solar cells

 
: Huljic, D.M.; Biro, D.; Preu, R.; Craff-Castillo, C.; Lüdemann, R.

:
Fulltext urn:nbn:de:0011-n-148684 (415 KByte PDF)
MD5 Fingerprint: 99e13868bba4c53ec7bbdfaeeee8618d
Created on: 7.11.2012


IEEE Electron Devices Society:
Twenty-Eighth IEEE Photovoltaic Specialists Conference 2000. Conference record : Anchorage Hilton Hotel, Anchorage, AK, 15 -22 September 2000
Piscataway: IEEE Operations Center, 2000
ISBN: 0-7803-5772-8
ISBN: 0-7803-5773-6
ISBN: 0-7803-5774-4
pp.379-382
Photovoltaic Specialists Conference <28, 2000, Anchorage/Alaska>
English
Conference Paper, Electronic Publication
Fraunhofer ISE ()
Silziumsolarzellen; Siebdruckkontakt; Rapid thermal firing

Abstract
Rapid Thermal Firing (RTF), i.e. firing of screen printed contacts using Rapid Thermal Processing (RTP), is a promising alternative compared to infrared heated conveyor belt furnaces concerning a reduction in process time. In addition, due to flexible process design and in-situ temperature measurement, RTF is well suited for detailed studies and optimisation of the firing process and the contact formation. Exploiting the advantages of RTP such as high heating and cooling rates and short plateau times, we have developed an RTF process with a very short total process time of 60 s and less than 10 s above 600 °C. Applying the process to large area cells (100 cm²) fill factors > 78 % have been achieved even on shallow RTP-diffused emitters with a grid shading of 7 %. Contact resistivity mappings of the rapid thermal fired front contact grid confirm a laterally homogeneous contact formation.

: http://publica.fraunhofer.de/documents/N-14868.html