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Thin film characterization using high frequency eddy current spectroscopy

: Heuer, H.; Hillmann, S.; Röllig, M.; Schulze, M.; Wolter, K.-J.

Institute of Electrical and Electronics Engineers -IEEE-; Institute of Electrical and Electronics Engineers -IEEE-, Nanotechnology Council:
9th IEEE Conference on Nanotechnology, NANO 2009 : Genoa, Italy, 26 - 30 July 2009
Piscataway/NJ: IEEE, 2010
ISBN: 978-1-4244-4832-6
ISBN: 978-981-08-3694-8
Conference on Nanotechnology (NANO) <9, 2009, Genoa>
Conference Paper
Fraunhofer IZFP, Institutsteil Dresden ( IKTS-MD) ()

By launching new processes introduced by nano science into much more conventional industrial applications fast, robust and economical reasonable inspection methods are required for process control and quality assurance. Due to the complexity of processes e.g. for thin film coatings or nano engineered materials, variations of material parameters like microstructures, grain boundary conditions, particle or void density etc. can occur by a minor shift of process parameters. Coming from high tech industries e.g. semiconductor industries the methods available for thin film characterization and quality control are complex and often require scientific skilled personal. The established methods for non destructive testing of materials and structures are behind the postulated requirements of modern materials modified on the nanoscale. This paper presents first results obtained by a new developed high frequency eddy current spectrograph on thin film coatings and crystalline materials.