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Electrical and topographical characterization of aluminum implanted layers in 4H silicon carbide
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2010
Book Article
Titel
Electrical and topographical characterization of aluminum implanted layers in 4H silicon carbide
Author(s)
Rambach, M.
Bauer, A.J.
Ryssel, H.
Hauptwerk
Silicon carbide. Vol.1
DOI
10.1002/9783527629053.ch7
Language
English
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Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB