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Highly sensitive detection of inorganic contamination

 
: Beckhoff, B.; Nutsch, A.; Altmann, R.; Borionetti, G.; Pello, C.; Polignano, M.L.; Codegoni, D.; Grasso, S.; Cazzini, E.; Bersani, M.; Lazzeri, P.; Gennaro, S.; Kolbe, M.; Müller, M.; Kregsamer, P.; Posch, F.

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Mertens, P.:
Ultra clean processing of semiconductor surfaces IX, UCPSS 2008 : 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), held in Bruges, Belgium, September 22 - 24, 2008
Stafa-Zurich: Trans Tech Publications, 2009 (Solid state phenomena 145/146)
ISBN: 3-908451-64-7
ISBN: 978-3-908451-64-8
ISSN: 1012-0394
pp.101
International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) <9, 2008, Bruges>
English
Conference Paper
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-147393.html