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Tailoring the properties of optical metamaterials

: Helgert, C.; Pertsch, T.; Rockstuhl, C.; Pshenay-Severin, E.; Menzel, C.; Kley, E.-B.; Chipouline, A.; Etrich, C.; Hübner, U.; Tünnermann, A.; Lederer, F.

Chinese Journal of Optics and Applied Optics 3 (2010), No.1, pp.1-10
ISSN: 1674-2915
Journal Article
Fraunhofer IOF ()
optical metamaterial; lithography; negative-index

In this contribution we review out latest achievements of combined experimental and theoretical studies to tailor the properties of optical metamaterials (MMs) at will. We give three examples of metamateiral design that have been realized by means of electron-beam lithography and whose spectroscopic characteristics have been comprehensively investigated. In every case, our experiments are complemented by rigorous numerical simulations. Particular emphasis is put on the significance of such tailored effecitve properties of optical MMs.