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Topography-aware BARC optimization for double patterning

: Liu, S.; Fühner, T.; Shao, F.; Barenbaum, A.; Jahn, J.; Erdmann, A.


Dusa, M.V. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.; Semiconductor Manufacturing Technology Consortium -SEMATECH-:
Optical microlithography XXIII : 23 - 25 February 2010, San Jose, California, United States; SPIE advanced lithography
Bellingham, WA: SPIE, 2010 (Proceedings of SPIE 7640)
ISBN: 978-0-8194-8054-5
Paper 76403C
Conference "Optical Microlithography" <23, 2010, San Jose/Calif.>
Conference Paper
Fraunhofer IISB ()
lithography simulation; bottom anti-reflective coating (BARC); waferstack optimization; double patterning

This paper aims at identifying appropriate bottom anti-reflective coatings (BARCs) for double patterning techniques such as Litho-Freeze-Litho-Etch (LFLE). A short introduction into the employed optimization methodology, including variables, figures of merit, models and optimization algorithms is given. A study on the impact of a refractive index modulation caused by the first lithographic step is presented. Several optimization surveys taking the index modulation into account are set forth, and the results are discussed. In addition to optimization procedures aiming at optimizing one litho step at a time, a co-optimization study for both litho steps is proposed. Finally, two multi-objective optimization procedures that allow for a post-optimization exploration and selection of optimum solutions are presented. Numerous solutions are discussed in terms of their anti-reflective behavior and their manufacturing feasibility.