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Exploration of linear and non-linear double exposure techniques by simulation

: Petersen, J.S.; Greenway, R.T.; Fühner, T.; Evanschitzky, P.; Shao, F.; Erdmann, A.


Levinson, H.J. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical microlithography XXII : 24 - 27 February 2009, San Jose, California, United States
Bellingham, WA: SPIE, 2009 (Proceedings of SPIE 7274)
ISBN: 978-0-8194-7527-5
Paper 72741V
Conference "Optical Microlithography" <22, 2009, San Jose/Calif.>
Conference Paper
Fraunhofer IISB ()
double exposure; double patterning; interference-assisted lithography; non-linear superposition; simulation study

In this work, a framework for the assessment of different double exposure techniques is laid out. Both the simulation environment and the utilized models, derived from well-established resist models, are discussed. Numerous simulation results are evaluated to investigate strengths and weaknesses of different double exposure approaches. Non-linear superposition techniques are examined in respect of their process performance for both standard and sub 0.25 ktief1 values. In addition to a study of these effects in the scope of basic layouts, an application to interference-assisted lithography (IAL) is proposed and discussed.