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Laterally graded Mo/Si multilayer for a 5 steradian EUV collector

 
: Perske, M.; Pauer, H.; Yulin, S.; Nesterenko, V.; Schürmann, M.; Feigl, T.; Kaiser, N.

Optical Society of America -OSA-, Washington/D.C.:
Optical Interference Coatings 2010. CD-ROM : Topical meeting and tabletop exhibit, June 6-11, 2010, Tucson, Arizona, USA. Technical digest
Washington, DC: OSA, 2010
ISBN: 978-1-55752-891-9
Paper MD3
Optical Interference Coatings Topical Meeting and Tabletop Exhibit (OIC) <2010, Tucson/Ariz.>
English
Conference Paper
Fraunhofer IOF ()

Abstract
The deposition of laterally graded Mo/Si multilayers for EUV collector optics is one of the key challenges to bring EUV Lithography to high volume manufacturing. Coating results of the world's largest EUV collector are presented.

: http://publica.fraunhofer.de/documents/N-143513.html