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Direct imprinting, post processing, and characterization of functional UV-curing materials

Poster at NNT 2010, 9th International Conference on Nanoimprint and Nanoprint Technology, Copenhagen, Denmark
Prägen, Nachprozessieren und Charakterisieren von funktionalen UV-härtenden Materialien
: Schmitt, H.; Kett, F.; Fader, R.; Rommel, M.; Bauer, A.J.; Hornung, M.; Frey, L.

Fulltext urn:nbn:de:0011-n-1433946 (628 KByte PDF)
MD5 Fingerprint: 26ab54d785630d34b2d04f5916f48dde
Created on: 27.10.2010

2010, 1 pp.
International Conference on Nanoimprint and Nanoprint Technology (NNT) <9, 2010, Copenhagen>
Poster, Electronic Publication
Fraunhofer IISB ()
nanoimprint; functional material; UV nanoimprint lithography; silver

Nanoimprint lithography (NIL) based patterning techniques typically use the imprinted resist as etching or lift-off mask to pattern underlying layers. This technology already proved to result in a high resolution. But, the ongoing success of the optical lithography, significant imprint related defects, and expensive subsequent pattern transfer processes prevented the introduction of NIL into large scale industrial applications. One way to promote NIL for industry is to identify low cost applications which can be realized by NIL and which will accept several minor imprint related defects (e.g., the texturing of LED surfaces to improve their light extraction). Another implementation might be the direct imprinting of elements like conductive paths, bond pads, or RFID antennas with a function al material. A functional material already has the physical properties of the final element. For UV-NIL, a functional material is a suspension of an UV-curing material that defines the shape of the element and a nanopowder, e.g. silver (Ag) that defines its functionality (electrical conductivity). In this work, three functional (silver filled) UV-curing materials were patterned exemplarily with the imprint stepper NPS300 and analyzed. The lowest specific electrical resistance for a self mixed suspension was 1.8·10-5Ω·cm after a post treatment. This is just one order of magnitude higher than the specific resistance of bulk silver.