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Plasma-etched organic layers for antireflection purposes

 
: Schulz, U.; Präfke, C.; Gödeker, C.; Kaiser, N.; Tünnermann, A.

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Applied optics 50 (2011), No.9, pp.C31-C35
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
English
Journal Article
Fraunhofer IOF ()

Abstract
Organic layers can be used to realize special functions in optical interference coatings. Suitable compounds for such layers were thermally evaporated and characterized. A plasma etching procedure was applied to produce nanostructures on top of the organic layers to reduce their effective refractive indices. Broadband antireflective coatings were obtained by combining these artificial low-index layers with conventionally prepared interference stacks.

: http://publica.fraunhofer.de/documents/N-142761.html