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  4. Plasma-etched organic layers for antireflection purposes
 
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2011
Journal Article
Title

Plasma-etched organic layers for antireflection purposes

Abstract
Organic layers can be used to realize special functions in optical interference coatings. Suitable compounds for such layers were thermally evaporated and characterized. A plasma etching procedure was applied to produce nanostructures on top of the organic layers to reduce their effective refractive indices. Broadband antireflective coatings were obtained by combining these artificial low-index layers with conventionally prepared interference stacks.
Author(s)
Schulz, U.
Präfke, C.
Gödeker, C.
Kaiser, N.
Tünnermann, A.
Journal
Applied optics  
DOI
10.1364/AO.50.000C31
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
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