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Preparation of photocatalytic TiO2-coatings by hollow cathode gas-flow sputtering

: Koeßler, D.; Ortner, K.; Höfer, M.; Szyszka, B.; Jung, T.

Kondruweit, S.; Szyszka, B.; Pütz, J. ; Fraunhofer-Institut für Schicht- und Oberflächentechnik -IST-, Braunschweig:
8th International Conference on Coatings on Glass and Plastics, ICCG 2010. Advanced Coatings for Large Area or High-Volume Products. Proceedings : June 13-17, 2010, Braunschweig, Germany
Braunschweig: IST, 2010
ISBN: 978-3-00-031387-5
International Conference on Coatings on Glass and Plastics (ICCG) <8, 2010, Braunschweig>
Conference Paper
Fraunhofer IST ()
titanium dioxide; photocatalysis; design of experiment (DOE); gas-flow sputtering (GFS)

Photocatalytic titanium dioxide (TiO2) films were produced with a high rate sputter process called gas-flow sputtering (GFS). Due to uniform target erosion GFS has a high degree of target utilization. Short pumping time due to rough vacuum, simple source- and generator- technique, just as well as stable reactive sputter processes and high deposition rates make this process interesting for industrial applications. For the first time design of experiments (DOE) techniques are used consequently, to assist the comprehension of the influence of the gas-flow sputtering process on layer properties. By applying a fully factorial design with center points main effects, interactions and the importance of nonlinear terms were analyzed for different target variables (filmproperties). Based on this result we investigated, how the photocatalytic activity correlates with structure, surface condition, crystallinity and other properties of the growing film. TiO2- layers applied by GFS show good photocatalytic activity which is superior to commercial sputtered.