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Particle generation during reactive sputtering of SiO2 with planar and cylindrical magnetrons

 
: Vergöhl, M.; Rademacher, D.

Kondruweit, S.; Szyszka, B.; Pütz, J. ; Fraunhofer-Institut für Schicht- und Oberflächentechnik -IST-, Braunschweig:
8th International Conference on Coatings on Glass and Plastics, ICCG 2010. Advanced Coatings for Large Area or High-Volume Products. Proceedings : June 13-17, 2010, Braunschweig, Germany
Braunschweig: IST, 2010
ISBN: 978-3-00-031387-5
pp.191-195
International Conference on Coatings on Glass and Plastics (ICCG) <8, 2010, Braunschweig>
English
Conference Paper
Fraunhofer IST ()
reactive magnetron sputtering; cylindrical magnetron; rotatables; SiO2; Nb2O5; optical property; particle

Abstract
SiO2 layers were deposited by mid-frequency pulsed reactive magnetron sputtering with cylindrical and planar dual magnetrons. The particle density in SiO2 films deposited at different process parameters is analyzed.

: http://publica.fraunhofer.de/documents/N-141262.html