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Next-generation test equipment for micro-production

: Zeitner, U.; Dannberg, P. et al.


Gorecki, C. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical Micro- and Nanometrology III : 13 - 16 April 2010, Brussels, Belgium
Bellingham, WA: SPIE, 2010 (Proceedings of SPIE 7718)
ISBN: 978-0-8194-8191-7
Paper 77180F
Conference "Optical Micro- and Nanometrology" <3, 2010, Brussels>
Conference Paper
Fraunhofer IOF ()
micro optic; low-coherence interferometry; laser interferometry; micro optics processing; interferometer array; smart pixel camera

The paper introduces different approaches to overcome the large ratio between wafer size and feature size in the testing step of micro production. For the inspection of Micro(Opto)ElectroMechanicalSystems (M(O)EMS) a priori information are available to optimise the inspection process. The EU-project SMARTIEHS develops a new concept for high volume M(O)EMS testing. The design of the test station and the fabrication of the first components are presented and the advancements compared to the state of the art are introduced within the following fields: micro-optical interferometer design, micro-optical production, smart-pixel camera and mechanical design. Furthermore the first demonstrators are introduced and experimental results are presented.