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Verfahren zum Abscheiden einer Nanokomposit-Schicht auf einem Substrat mittels chemischer Dampfabscheidung

Depositing nanocomposite layer on substrate using chemical reaction inside vacuum chamber, comprises guiding starting material of the chemical reaction into the chamber through inlet, and then guiding further gas into the vacuum chamber
 
: Fahland, M.; Vogt, T.; Günther, S.; Schiller, N.

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Frontpage ()

DE 102008056968 A: 20081113
DE 102008056968 A: 20081113
C23C0016
German
Patent, Electronic Publication
Fraunhofer FEP ()

Abstract
(A1) Die Erfindung betrifft ein Verfahren zum Abscheiden einer Nanokomposit-Schicht auf einem Substrat (2) mittels einer chemischen Reaktion innerhalb einer Vakuumkammer (5), wobei zumindest ein Ausgangsmaterial der chemischen Reaktion durch einen Einlass (7) in die Vakuumkammer (5) gefuehrt wird, wobei das Ausgangsmaterial gebildet wird, indem eine Fluessigkeit derart mit Nanopartikeln vermischt wird, dass die Nanopartikel in der Fluessigkeit in dispergierter Form vorliegen und dass das Ausgangsmaterial als Aerosol in die Vakuumkammer (5) eingelassen wird.

 

EP 2186922 A1 UPAB: 20100527 NOVELTY - The method for depositing a nanocomposite layer on a substrate (2) using a chemical reaction inside a vacuum chamber (5), comprises guiding a starting material of the chemical reaction into the vacuum chamber through an inlet, and then guiding a further gas into the vacuum chamber through the inlet next to the starting material for the chemical reaction, where the starting material is formed by mixing a liquid with nanoparticles such as carbon nanotubes, so that nanoparticles in the liquid is present in a dispersed form, and is admitted as aerosol into the vacuum chamber with a carrier gas. DETAILED DESCRIPTION - The method for depositing a nanocomposite layer on a substrate (2) using a chemical reaction inside a vacuum chamber (5), comprises guiding a starting material of the chemical reaction into the vacuum chamber through an inlet, and then guiding a further gas into the vacuum chamber through the inlet next to the starting material for the chemical reaction, where the starting material is formed by mixing a liquid with nanoparticles such as carbon nanotubes so that nanoparticles in the liquid are present in a dispersed form, and is admitted as aerosol into the vacuum chamber with a carrier gas such as argon. Plasma is generated in the vacuum chamber and supports the chemical reaction. Two magnetrons are alternatively switched as cathode and associated anode of a gas discharge. The inlet is temporarily switched as anode of the gas discharge in the area of the inlet opening. The magnetron is operated with a DC-current supply or a pulsed DC-current supply. The magnetron and the inlet are alternatively operated as cathode and associated anode of the gas discharge, where the magnetron is operated using a pulse-packet current supply. The liquid is metal organic or silicon organic compound. USE - Method for depositing a nanocomposite layer on a substrate using a chemical reaction inside a vacuum chamber. ADVANTAGE - The method is capable of effectively and homogeneously depositing the nanocomposite layer on the substrate with good electrical conductivity and high deposition rate, and realizes mechanical protection effect.

: http://publica.fraunhofer.de/documents/N-139571.html