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Al Top Cathode Deposition on OLED Using DC Magnetron Sputtering

 
: Gil, T.H.; May, C.; Lakner, H.; Leo, K.; Keller, S.

:

Plasma Processes and Polymers 6 (2009), S1, S808-S812
ISSN: 1612-8850
ISSN: 1612-8869
English
Journal Article
Fraunhofer IPMS ()

Abstract
We fabricated OLEDs having the evapd. Yb cathode and the sputtered Al cathode. Magnetron sputtering is a versatile deposition method, but the energetic particles during sputtering process can damage the underlying org. layers. We applied various process parameters to explain the role of Ar neutrals quoting the former researches. OLEDs showed almost comparable degrdn. under the discharge voltage of 300 V, but serious degrdns. were found at the discharge voltage of over 300 V and the low process pressure. The degrdns. influenced on the lifetime of OLED, and the measured luminance decay was much larger than the OLED having the evapd. Yb cathode due to the high leakage currents. [on SciFinder(R)]

: http://publica.fraunhofer.de/documents/N-139365.html