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Subsurface material characterization using high frequency eddy current spectroscopy

: Heuer, H.; Hillmann, S.; Klein, M.; Meyendorf, N.


Peters, K.J. (Hrsg.) ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Smart sensor phenomena, technology, networks, and systems 2010 : 8 - 10 March 2010, San Diego, California, United States
Bellingham, WA: SPIE, 2010 (Proceedings of SPIE 7648)
ISBN: 978-0-8194-8063-7
Paper 76480X
Conference Smart Sensor Phenomena, Technology, Networks, and Systems <2010, San Diego/Calif.>
Conference Paper
Fraunhofer IZFP, Institutsteil Dresden ( IKTS-MD) ()

New processes introduced by nano science into much more conventional industrial applications require fast, robust and economical reasonable inspection methods for process control and quality assurance. Developed for semiconductor industries the methods available for thin film characterization and quality control are often complex and require highly skilled operation personnel. This paper presents a new concept based on high frequency eddy current spectroscopy that allows reliable and robust thickness measurements of thin conducting films on silicon or insulation substrates with a thickness resoln. of about 2.5 nm. The transmission mode sensor configuration is a more practical method for inlinemonitoring of thin film characterization. Due to the insensitivity of the transmission mode to dislocations or slight tilting of the sample the high frequency eddy current method is a practical method for thin film characterization in the industrial environment.