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Application of numerical optimization algorithms used to investigation of thin films in nanoindentation test

 
: Dowhán, L.; Wymyslowski, A.; Wittler, O.; Mrosko, R.

:

Institute of Electrical and Electronics Engineers -IEEE-:
11th international thermal, mechanical & multi-physics simulation, and experiments in microelectronics and microsystems, EuroSimE 2010 : Bordeaux / France; 26.-28.04.2010
Piscataway/NJ: IEEE, 2010
ISBN: 978-1-4244-7026-6
ISBN: 978-1-4244-7027-3
pp.442-446
International Conference on Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE) <11, 2010, Bordeaux>
English
Conference Paper
Fraunhofer IZM ()

Abstract
Current developments and trends in microelectronics are focused on thin layers and novel materials. This leads to application of different test and measurement methods, which are capable to measure basic mechanical properties of such materials on micro-scale and nano-scale. This paper focuses on application of the nanoindentation technique. It is one of the most common method for investigating the mechanical material properties (especially thin layers). In order to extract the basic elastic and elasto-plastic mechanical properties the numerical optimization algorithms were used as a support for the tests in combination with the FE-model of the nanoindentation process.

: http://publica.fraunhofer.de/documents/N-137132.html