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Exposure and characterization of super structure gratings for DBR lasers generated by direct write electron-beam lithography

: Steingrüber, R.; Engel, H.; Löffler, R.; Sakkas, C.


Warlaumont, J.M. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Electron-beam, x-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California
Bellingham, Wash.: SPIE, 1995 (SPIE Proceedings Series 2437)
ISBN: 0-8194-1785-8
Conference "Electron-beam, X-ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing" <5, 1995, Santa Clara/Calif.>
Conference Paper
Fraunhofer HHI ()
diffraction gratings; distributed bragg reflector lasers; electron beam lithography; laser tuning; optical fabrication; semiconductor lasers; super structure gratings; dbr lasers; direct write electron-beam lithography; tuning range; continuously chirped gratings; resist profiles; ssg characterization

Semiconductor lasers with a wide tuning range can be fabricated with the use of super structure gratings (SSG). In this paper we give a short introduction to SSGs, the technical problem of their realization and the existing techniques to generate SSGs. A method is presented to generate 'true' continuously chirped gratings overcoming the technical restrictions. Furthermore we make a proposal on how to characterize SSGs in resist profiles.