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Diffractive optical elements: Fabrication and measurement of wavelength division multiplexer

: Pawlowski, E.

Honda, T. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
International Conference on Applications of Optical Holography 1995. Proceedings : 5-7 June 1995, Tokyo, Japan
Bellingham/Wash.: SPIE, 1995 (SPIE Proceedings Series 2577)
ISBN: 0-8194-1938-9
International Conference on Applications of Optical Holography <1995, Tokyo>
Conference Paper
Fraunhofer HHI ()
antireflection coatings; demultiplexing equipment; diffraction gratings; integrated optics; light diffraction; optical fabrication; optical glass; optical losses; photolithography; replica techniques; sputter deposition; wavelength division multiplexing; diffractive optical elements; wavelength division demultiplexer; fabrication process; 3d structure replication technique; thin film deposition; ion beam sputter deposition; fresnel zone lens; quartz glass substrate; integrated diffractive optical elements; 1.55 micron; -3.5 db; 2 nm; sio2

A new type of wavelength division demultiplexer (DEMUX), which consists of a pair of diffractive optical elements integrated on one substrate, is presented. The 3 dB resolution of the DEMUX is about 2 nm and the measured losses are about -3.5 dB at 1.55 mu m wavelength. To simplify the fabrication process of the integrated diffractive optical elements, a new 3D structure replication technique is proposed.