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Simultaneous exposure of filter gratings and waveguides by direct write electron-beam lithography

: Steingrüber, R.; Hamacher, M.


Microelectronic engineering 35 (1997), No.1-4, pp.341-344
ISSN: 0167-9317
International Conference on Micro- and Nanofabrication (MNE) <1996, Glasgow>
Conference Paper, Journal Article
Fraunhofer HHI ()
electron beam lithography; integrated optoelectronics; optical planar waveguides; optical receivers; optical waveguide filters; proximity effect (lithography); direct write electron-beam lithography; simultaneous exposure; filter gratings; waveguides; synchronous generation; precise adjustment; interface waveguide-grating; proximity correction; dose assignment; address grids; dry etching; characteristic filter curves; photonic integrated circuits; bidirectional transceiver

A novel process enabling the simultaneous electron-beam exposure of different types of structures is presented, illustrated by the synchronous generation of filter gratings and waveguides. Optimized results for a precise adjustment of the interface waveguide-grating are shown, as well as the necessity for proximity correction achieved by dose assignment. The accommodation of the different address grids makes the pre-fixing of the vertical and horizontal adjustments possible. The structures are then transferred into the semiconductor by means of dry etching. The devices and their characteristic filter curves are presented.