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1997
Journal Article
Titel
Simultaneous exposure of filter gratings and waveguides by direct write electron-beam lithography
Abstract
A novel process enabling the simultaneous electron-beam exposure of different types of structures is presented, illustrated by the synchronous generation of filter gratings and waveguides. Optimized results for a precise adjustment of the interface waveguide-grating are shown, as well as the necessity for proximity correction achieved by dose assignment. The accommodation of the different address grids makes the pre-fixing of the vertical and horizontal adjustments possible. The structures are then transferred into the semiconductor by means of dry etching. The devices and their characteristic filter curves are presented.
Tags
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electron beam lithography
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integrated optoelectronics
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optical planar waveguides
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optical receivers
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optical waveguide filters
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proximity effect (lithography)
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direct write electron-beam lithography
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simultaneous exposure
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filter gratings
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waveguides
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synchronous generation
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precise adjustment
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interface waveguide-grating
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proximity correction
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dose assignment
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address grids
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dry etching
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characteristic filter curves
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photonic integrated circuits
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bidirectional transceiver