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Multi-technique study of carbon contamination and cleaning of Mo/Si multilayer optics exposed to pulsed EUV radiation

 
: Schürmann, M.; Yulin, S.; Nesterenko, V.; Feigl, T.; Kaiser, N.; Tkachenko, B.; Schürmann, M.C.

:

Fontaine, B.M. la ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Extreme Ultraviolet (EUV) Lithography : 22-25 February 2010, San Jose, California
Bellingham, WA: SPIE, 2010 (Proceedings of SPIE 7636)
ISBN: 978-0-8194-8050-7
Paper 76361P
Conference "Extreme Ultraviolet (EUV) Lithography" <2010, San Jose/Calif.>
English
Conference Paper
Fraunhofer IOF ()

Abstract
Comparative lifetime studies of Mo/Si multilayer mirrors have been conducted at the Exposure Test Stand (ETS) using a pulsed Xe-discharge EUV source at XTREME Technologies GmbH (Göttingen, Germany). Due to the large, homogeneous exposed sample area a multi-technique study of EUV induced carbon contamination and cleaning can be conducted using standard surface science techniques. EUV-reflectometry, X-ray photoelectron spectroscopy (XPS), small-angle X-ray reflectometry (SAXR), and Out-of-band (OOB) reflectometry (200 - 1000 nm) were applied to investigate exposed samples and study EUV-induced changes of the surface composition. With this approach the influence of EUV-dose, cleaning-gas pressure and composition, and capping-layer material of the Mo/Si multilayer samples on the degradation and cleaning mechanism can be studied.

: http://publica.fraunhofer.de/documents/N-132150.html