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1997
Journal Article
Titel
Multilevel diffractive optical elements fabricated with a single amplitude-phase mask
Abstract
To simplify the fabrication process of multilevel diffractive optical elements a new fabrication technique is presented. The fabrication process is based on a single optical lithography step and a subsequent dry-etching process. Lateral structures with dimensions of 180 nm were transferred. The fabricated diffractive optical elements show high optical performance with diffraction efficiencies of over 90%.
Tags
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etching
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lenses
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masks
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optical elements
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optical fabrication
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optical testing
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photolithography
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zone plates
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multilevel diffractive optical elements
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single amplitude-phase mask
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fabrication process
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fabrication techniques
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optical lithography step
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dry-etching process
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lateral structures
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optical performance
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diffraction efficiencies
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90 percent
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180 nm