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1998
Journal Article
Title
Metalorganic molecular beam epitaxial growth of semi-insulating GaInAsP( lambda g=1.05 mu m):Fe optical waveguides for integrated photonic devices
Abstract
Iron doping of InP and GaInAsP( lambda g=1.05 mu m) layers grown by metalorganic molecular beam epitaxy was studied using elemental source material in combination with a conventional effusion cell. This study was aimed at the creation of semi-insulating optical waveguides under growth conditions compatible with selective area growth. Secondary ion mass spectroscopy measurements revealed a reproducible and homogeneous incorporation behavior of the iron dopant in the materials investigated. Resistivities in excess of 109 Omega cm were obtained for both compositions at medium doping levels. GaInAsP/InP waveguide structures grown at 485 degrees C-the minimum temperature necessary for selective deposition-exhibited averaged resistivities of 5*107 Omega cm in combination with optical losses of 2.5+or-0.5 dB/cm.
Keyword(s)
chemical beam epitaxial growth
electrical resistivity
gallium arsenide
gallium compounds
iii-v semiconductors
indium compounds
integrated optoelectronics
iron
optical losses
optical waveguides
secondary ion mass spectra
semiconductor doping
semiconductor growth
metalorganic molecular beam epitaxial growth
mombe
integrated photonic devices
iron doping
elemental source material
effusion cell
semi-insulating optical waveguides
secondary ion mass spectroscopy
incorporation behaviour
resistivities
doping levels
GaInAsP/InP waveguide structures
1.05 mum
1e9 ohmcm
485 c
5e7 ohmcm